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1 article(s) from Heiler, Tobias

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Cheng Huang,
Markus Moosmann,
Jiehong Jin,
Tobias Heiler,
Stefan Walheim and
Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

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Figure 1: Schematic drawing of the polymer-blend lithography process. After spin-coating in a controlled atmo...

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Figure 2: Preparation of a densely packed SAM, performed in the vapor phase within a desiccator.

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Figure 3: Fabrication of a two-phase SAM template spin-cast at a humidity of 45%. (a) Schematic drawing of th...

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Figure 4: Dependence of the PS island diameter and height by varying the molar mass of PS. (a) AFM images of ...

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Figure 5: Fabrication of a three-phase SAM template spin cast at the humidity of 65%. (a) Schematic drawing o...

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Published 04 Sep 2012

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